Simple UV-based Soft-lithography Process for Fabrication of Low-Loss Polymer PSQ-L-based Waveguides

We propose a simple UV based soft-lithography process for fabrication of low-loss polymer PSQ-L waveguides. The fabrication process consists of two steps: the imprint step for structuring is done first on the cladding PSQ-LL layer and is followed by a spin-coating step to fill the imprinted features with core PSQ-LH layer material. Even with non-polishing waveguide facets, the extracted scattering loss of straight waveguides by a Fabry-Perot resonance method is less than 0.8dB/cm for the TE mode. The fully transferred pattern and low scattering loss proves it to be an effective way to replicate low-loss polymer PSQ-L-based waveguides.